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Custom Application
Model | Max Output | introduction | |
---|---|---|---|
Voltage(KV) | Power(W) | ||
|
1KV 3KV 5KV 6KV 8KV |
0.5W 1W 2W 4W 5W 6W 8W 10W |
1. Output voltage up to ±8KV, power 0.5W-10W 2. Optional RS-232, RS-485 control |
|
1KV 5KV 8KV 10KV 15KV 18KV 20KV |
2W 5W 8W 10W |
1. The output voltage is up to ±20KV, and the power is 2W-10W |
|
1KV 5KV 10KV 15KV 20KV 25KV 30KV |
5W 6W 8W 10W |
1. Output voltage up to ±30KV, power 5W-10W |
|
1KV 5KV 10KV 15KV 20KV 25KV 30KV |
5W 6W 8W 10W |
1. Output voltage up to ±30KV, power 5W-10W |
|
1KV 5KV 10KV 15KV 20KV 25KV 30KV |
5W 6W 8W 10W |
1. Reliable packaging, long-term corona-free operation |
|
20KV 30KV |
4W |
Transmission Scanning Electron Microscope Scanning Electron Microscope High Precision, Low Noise, Ultra Stable Over Current/Voltage Protection Arc and Short Circuit Protection RS232/485 OPTIONAL OEM Customization Available Ripple 2ppm |
|
15KV 30KV 35KV |
12W |
TYPICAL APPLICATION: Processing and repair |
|
30KV |
6W |
1.Integrated accelerator and electron source system power supply |
|
45KV |
10W |
TYPICAL APPLICATIONS Milling and repairing Ripple : 2 ppm |
|
60KV |
20W |
TYPICAL APPLICATIONS Ripple 2ppm |
|
100KV |
10W |
1.100kV high voltage power supply for semiconductor exposure machine |
|
3.5KV |
0.05W 3.5W |
PF power supply is a high-stability, low-ripple, high-voltage power supply with input and output isolation. It is mainly used for microchannel boards and imaging detectors. The output voltage of the power supply is 50V~3.5kV. The output terminal of the output power supply can be suspended at ±2.5kV ( PFxxF2.5), ±10kV (PFxxF10), ±20kV (PFxxF20) and ±30kV (PFxxF30). |
|
7.5KV |
7.5W 37.5W |
Wisman's FF module is a special filament power supply module for mass spectrometers, electron microscopes, X-ray tubes, traveling wave tubes and other special ultra-low noise, high stability, miniaturized input and output multiple isolation voltages. The price is advantageous. |
|
80KV 120KV 200KV 300KV |
60W |
Transmission Electron Microscope Power Supplies OEM Customation availble Voltage: 80kv,120kv,200kv,300kv Current: 100-300uA |
|
1KV 2KV 2.5KV 3KV 5KV 10KV 15KV 20KV 30KV |
5W 10W 20W |
1. The output voltage is up to 30KV, the output power is 5W, 10W, 20W 11.CE certification |
|
1KV 2KV 2.5KV 3KV 5KV 10KV 15KV 20KV 30KV |
2W 2.5W 3W 4W 5W 8W 10W 20W |
1. The output voltage is up to 30KV, and the output power is 20W 11.CE certification |
|
30KV |
6W |
|
|
0KV |
0W |
1. The computer end is equipped with a standard ET, RS-232, RS-485 control is optional 2. The control unit output fiber 4, 8, 16 channels optional 3. The control unit outputs RS-485, 4, 8, 16 channels are optional 4. AC AC220V power supply 5. Be used for controlling of over 2 sets' high-voltage power supply 6. Used in harsh electromagnetic interference environment 7. OEM customization available 8. Control unit |
|
35KV |
9 W |
FEM Power (W): 9 Maximum output voltage (KV): 35 Typical Application: Field Emission Scanning Electron Microscope Electron Beam Power Supply Ripple:2ppm |
|
30KV |
6W |
Electron microscope high voltage power supply Scanning electron microscope SEM Field Emission Electron Microscopy FEM Semiconductor Analysis, Processing and Repair Ion Beam Etching Focused Ion Beam Lithography |
|
2KV |
6W |
Power (W):6 Max Output Voltage (KV):2
Features and Benefits: Reliable clamp/release state detection by wafer sensor Fast response of amplifier architecture design ("no relay polarity inversion" design for high reliability and long life.) "Dual channel independent control (option)" and "center tap voltage setting (option)" for various chuck/release operations Equipped with LAN, USB, RS-232C digital interface Built-in low-pass RF filter (13.56 MHz) |
|
2KV |
13W |
1、Improves efficiency and wafer throughput three times that of ordinary power supplies; 2、Reduce backside gas errors, improve throughput and eliminate wafer stick/burst problems; 3、Control parameters such as overcurrent, presence of wafer and wafer clamp thresholds, clamp voltage, offset voltage, and internal or external amplitude/offset controls; 4、The versatility of amplitude/offset and output control during adjustment; 5、Control output using rear panel I/O, serial computer commands, or front panel controls; 6、Configuration of custom clamp and clamp removal sequence and waveform; 7、Lockable front panel control interface; 8、Supports Coulombic and Johnsen-Rahbek ESC technologies 9、This section describes how to upload the configuration file of an electrostatic chuck to the device and store it in the device using a user-friendly software interface; 10、Wafer detection includes wafer free, wafer presence, or wafer clamped state |
|
3KV |
19.5W |
Improves efficiency and throughput: three times that of ordinary power supplies; Reducing back-side gas errors, increasing throughput and eliminating wafer sticking/bursting problems; Control of parameters such as overcurrent, presence of wafer and wafer clamping thresholds, clamping voltage, offset voltage and internal or external amplitude/offset control; Versatility in amplitude/offset and output control during tuning; Control of outputs using rear panel I/O, serial computer commands, or front panel controls; Configuration of custom clamp and de-clamp sequences and waveforms. Lockable front panel control interface. Support for Coulombic and Johnsen-Rahbek ESC technologies. Upload and store electrostatic chuck profiles to the device and store them internally through a user-friendly software interface. Wafer detection including no wafer, present wafer or wafer clamping status. |
|
60KV |
1200W |
1.Suitable for melt blown cloth with a width of 800mm-1600mm |
|
0.1KV 0.15KV 0.2KV 0.25KV 0.3KV 0.35KV 0.4KV 0.45KV 0.5KV 0.6KV 0.7KV 0.8KV 0.9KV 1KV 1.2KV 1.5KV 2KV 2.5KV 3KV 4KV 5KV 6KV 8KV 10KV |
0.5W 1.25W |
1.Can be suspended on another power supply |
|
0.3KV 0.6KV 1.1KV 1.5KV 2KV 2.5KV 3KV 6KV 10KV 15KV 25KV |
3W 6W |
1.Can be suspended on another power supply |
|
50KV |
300W |
1. Suitable for melt blown cloth with width ≤650mm |
|
100KV |
2000W |
1.Suitable for melt blown cloth with a width of 1800mm-4800mm |
|
62KV |
3000W |
1. Metal 3D printer, dedicated for electron beam welding |
|
60KV 80KV 100KV 120KV 150KV |
100W |
1. Metal 3D printer, dedicated for electron beam welding |